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	1.	Thin-film deposition : principles and practice by Donald L. Smith by Smith, Donald L Series: ; Edition: Material type: Book; Literary form: Not fiction Current publication frequency: .Language: English Publication details: New York: McGraw-Hill, , c1995 Availability: Items available for loan: IIT Gandhinagar (1)Call number: 621.38152 SMI. Place hold Request article Add to cart (remove)
	2.	Principles of chemical vapor deposition edited by Daniel M. Dobkin and Michael K. Zuraw by ,Dobkin, D.M Zuraw, Michael K Dobkin, Daniel Mark Series: ; Edition: Material type: Book; Format: print ; Literary form: Not fiction Current publication frequency: . Publication details: London Kluwer Academic Publishers 2003 Availability: Items available for loan: IIT Gandhinagar (1)Call number: 671.735 PRI. Place hold Request article Add to cart (remove)
	3.	Handbook of physical vapor deposition (PVD) processing by Mattox, Donald M Edition: 2 nd Publication details: Oxford: William Andrew, 2010 Availability: Items available for loan: IIT Gandhinagar (1)Call number: 671.735 MAT. Place hold Request article Add to cart (remove)

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