Principles of chemical vapor deposition edited by Daniel M. Dobkin and Michael K. Zuraw

By:

,Dobkin, D.M

Contributor(s):

Zuraw, Michael K
Dobkin, Daniel Mark

Material type: Book

BookSeries: ; Current publication frequency: .Publication details: London Kluwer Academic Publishers 2003Edition: Description: xi, 273 p: ill; 25 cmISBN:

9781402012488

Subject(s):

Metalworking & primary metal products
Vapor-plating
Refractory coating
Chemical vapor deposition

DDC classification:

671.735 PRI

LOC classification:

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Holdings
Item type	Current library	Collection	Call number	Status	Date due	Barcode
Books	IIT Gandhinagar	General	671.735 PRI (Browse shelf(Opens below))	Available		014456

Includes bibliographical references and index

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