Atomic layer deposition: principles, characteristics, and nanotechnology applications

By:

Kaariainen, Tommi

Contributor(s):

Material type:

TextPublication details: Wiley, 2024.Edition: 2nd edISBN:

9781118747421

Subject(s):

DDC classification:

621.38152 KAA

Online resources:

Click here to access e-book

Summary: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials

List(s) this item appears in: IEEE-Wiley Semiconductor Ebooks

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Item type	Current library	Call number	Materials specified	URL	Status
E- Books	IIT Gandhinagar	621.38152 KAA (Browse shelf(Opens below))	IEEE-Wiley Semiconductor Ebooks	Link to resource	Available

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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials

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