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Run-to-run control in semiconductor manufacturing

By: Contributor(s): Publication details: Boca Raton: CRC Press, 2001.Description: xiii, 348p.: ill.; hbk.: 23cmISBN:
  • 9780849311789
Subject(s): DDC classification:
  • 621.38152 MOY
Summary: Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control. https://www.routledge.com/Run-to-Run-Control-in-Semiconductor-Manufacturing/Moyne-delCastillo-Hurwitz/p/book/9780849311789
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Item type Current library Collection Call number Copy number Status Date due Barcode
Books Books IIT Gandhinagar General 621.38152 MOY (Browse shelf(Opens below)) 1 Available 034128

Includes List of Acronyms and Index

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

https://www.routledge.com/Run-to-Run-Control-in-Semiconductor-Manufacturing/Moyne-delCastillo-Hurwitz/p/book/9780849311789

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