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Principles of chemical vapor deposition edited by Daniel M. Dobkin and Michael K. Zuraw

By: Contributor(s): Material type: BookBookSeries: ; Current publication frequency: .Publication details: London Kluwer Academic Publishers 2003Edition: Description: xi, 273 p: ill; 25 cmISBN:
  • 9781402012488
Subject(s): DDC classification:
  • 671.735 PRI
LOC classification:
  •  
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Includes bibliographical references and index

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