Principles of chemical vapor deposition edited by Daniel M. Dobkin and Michael K. Zuraw
Material type: BookSeries: ; Current publication frequency: .Publication details: London Kluwer Academic Publishers 2003Edition: Description: xi, 273 p: ill; 25 cmISBN:- 9781402012488
- 671.735 PRI
Item type | Current library | Collection | Call number | Status | Date due | Barcode |
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Books | IIT Gandhinagar | General | 671.735 PRI (Browse shelf(Opens below)) | Available | 014456 |
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Includes bibliographical references and index
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