| 000 | 01432nam a2200277 4500 | ||
|---|---|---|---|
| 020 | _a9781118747421 | ||
| 082 | _a621.38152 KAA | ||
| 100 | _aKaariainen, Tommi | ||
| 245 | _aAtomic layer deposition: principles, characteristics, and nanotechnology applications | ||
| 250 | _a2nd ed. | ||
| 260 |
_bWiley, _c2024. |
||
| 504 | _aIncludes index | ||
| 520 | _aSince the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials | ||
| 650 | _aCircuits | ||
| 650 | _aDielectrics | ||
| 650 | _aEngineered Materials | ||
| 650 | _aDevices and Systems | ||
| 650 | _aNanotechnology | ||
| 650 | _aManufacturing technology | ||
| 650 | _aIEEE-Wiley Semiconductor Ebooks | ||
| 700 |
_aCameron, David _eCo author |
||
| 700 |
_aKaariainen, Marja-Leena _eCo author |
||
| 700 |
_aSherman, Arthur _eCo author |
||
| 856 |
_uhttps://ieeexplore.ieee.org/servlet/opac?bknumber=10513451 _yClick here to access e-book |
||
| 942 |
_2ddc _cE |
||
| 999 |
_c62942 _d62942 |
||