000			01522nam a2200241 4500
020			_a9783527639939
082			_a621.38152 PIN
100			_aPinna, Nicola (Ed.)
245			_aAtomic layer deposition of nanostructured materials
260			_bWiley, _c2024.
504			_aIncludes index
520			_aAtomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique).
650			_aCircuits
650			_aEngineered Materials
650			_aDielectrics
650			_aPlasmas
650			_aNanotechnology
650			_aManufacturing technology
650			_aIEEE-Wiley Semiconductor Ebooks
700			_aKnez, Mato _eEditor
856			_uhttps://ieeexplore.ieee.org/servlet/opac?bknumber=10518221 _yClick here to access e-book
942			_2ddc _cE
999			_c62941 _d62941