| 000 | 00885nam a2200373 454500 | ||
|---|---|---|---|
| 008 | 160319bc2009. xxu||||| |||| 00| 0 eng d | ||
| 015 |
_2 _a |
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| 016 |
_2 _a |
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| 020 | _a9780819475602 | ||
| 040 |
_a _c _d |
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| 050 |
_a _b |
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| 082 | _a621.381531 LIN | ||
| 100 | _aLin, Burn J. | ||
| 222 |
_a _b |
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| 245 |
_aOptical lithography : here is why _b _c |
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| 250 |
_a _b |
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| 260 |
_6 _aBellingham: _bSPIE Press, _cc2009. |
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| 300 |
_axiv, 477 p. : _bill. ; _c26 cm. |
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| 310 |
_a _b |
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| 440 |
_a _v |
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| 500 |
_3 _ancludes index. |
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| 611 |
_a _c |
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| 653 | _aApplied physics | ||
| 653 | _a Microlithography. | ||
| 653 | _aSemiconductors --Etching | ||
| 653 | _aLasers --Industrial applications | ||
| 906 |
_a _b _c _d _e _f _g |
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| 923 |
_a _c |
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| 925 |
_a _b _x |
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| 955 |
_d _e _f _g _t |
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| 963 | _a | ||
| 991 |
_w _t _p _i _h _b |
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| 999 |
_c31615 _d31615 |
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