| 000 | 01103nam a2200409 454500 | ||
|---|---|---|---|
| 008 | 160319b c2010. xxu||||| |||| 00| 0 eng d | ||
| 015 |
_2 _a |
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| 016 |
_2 _a |
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| 020 | _a9780470596975 | ||
| 040 |
_a _c _d |
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| 050 |
_a _b |
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| 082 | _a621.381531 MAX | ||
| 100 | _aMa, Xu, | ||
| 222 |
_a _b |
||
| 245 |
_aComputational lithography _b _c |
||
| 250 |
_a _b |
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| 260 |
_6 _aNew York _bWiley _c c2010. |
||
| 300 |
_axv, 226 p.: _bill; _c25cm. |
||
| 310 |
_a _b |
||
| 440 |
_a _v |
||
| 490 |
_611588 _aWiley series in pure and applied optics. |
||
| 500 |
_3 _aIncludes bibliographical references and index. |
||
| 611 |
_a _c |
||
| 653 | _aApplied physics | ||
| 653 | _aMicrolithography -- Mathematics. | ||
| 653 | _aIntegrated circuits -- Design and construction -- Mathematics. | ||
| 653 | _aPhotolithography -- Mathematics. | ||
| 653 | _aSemiconductors -- Etching -- Mathematics. | ||
| 653 | _aResolution (Optics) | ||
| 906 |
_a _b _c _d _e _f _g |
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| 923 |
_a _c |
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| 925 |
_a _b _x |
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| 955 |
_d _e _f _g _t |
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| 963 | _a | ||
| 991 |
_w _t _p _i _h _b |
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| 999 |
_c31200 _d31200 |
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