Gang He <br/><br/>
High-k gate dielectrics for CMOS technology 

 -  Wiley,  2024. 
<br/><br/> State-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological<br/>viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these<br/>materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.<br/><br/>Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections<br/>with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering. 
<br/><br/><label>ISBN: </label>9783527646371 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Circuits<br/>Devices<br/>Systems<br/>Engineered Materials<br/>Dielectrics<br/>Plasmas
<br/><br/><label>Dewey Class. No.: </label>621.38152 GAN