TY  - BOOK
AU  - Kaariainen, Tommi
AU  - Cameron, David
AU  - Kaariainen, Marja-Leena
AU  - Sherman, Arthur
TI  - Atomic layer deposition: principles, characteristics, and nanotechnology applications
SN  - 9781118747421
U1  - 621.38152 KAA 
PY  - 2024///
PB  - Wiley
KW  - Circuits
KW  - Dielectrics
KW  - Engineered Materials
KW  - Devices and Systems
KW  - Nanotechnology
KW  - Manufacturing technology
KW  - IEEE-Wiley Semiconductor Ebooks
N1  - Includes index
N2  - Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials
UR  - https://ieeexplore.ieee.org/servlet/opac?bknumber=10513451
ER  -