Kaariainen, Tommi <br/><br/>
Atomic layer deposition: principles, characteristics, and nanotechnology applications 

 - 2nd ed. 
 -  Wiley,  2024. 
<br/><br/>Includes index 
<br/><br/> Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials 
<br/><br/><label>ISBN: </label>9781118747421 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Circuits<br/>Dielectrics<br/>Engineered Materials<br/>Devices and Systems<br/>Nanotechnology<br/>Manufacturing technology<br/>IEEE-Wiley Semiconductor Ebooks
<br/><br/><label>Dewey Class. No.: </label>621.38152 KAA