Moyne, James (Ed.) <br/><br/>
Run-to-run control in semiconductor manufacturing 

 - Boca Raton:  CRC Press,  2001. 
 - xiii, 348p.:  ill.; hbk.:  23cm. 
<br/><br/>Includes List of Acronyms and Index 
<br/><br/> Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.<br/><br/>https://www.routledge.com/Run-to-Run-Control-in-Semiconductor-Manufacturing/Moyne-delCastillo-Hurwitz/p/book/9780849311789 
<br/><br/><label>ISBN: </label>9780849311789 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Run-top-Run Control<br/>Semiconductor Manufacturing Process Control<br/>Neural Network Algorithms<br/>Generic Cell Controller<br/>Linear Approximation Algorithms<br/>Chemical-Mechanical Planarization
<br/><br/><label>Dewey Class. No.: </label>621.38152 MOY