Lin, Burn J. <br/><br/>
Optical lithography : here is why   

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 - Bellingham:  SPIE Press,  c2009. 
 - xiv, 477 p. :  ill. ;  26 cm. 
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 -   .
<br/><br/> ncludes index. 
<br/><br/><label>ISBN: </label>9780819475602 
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<br/><br/><label>Nat. Bib. No.: </label>  
<br/><br/><label>Nat. Bib. Agency Control No.: </label>  
<br/><br/><label>Subjects--Meeting Names: </label><br/>  
<br/><br/><label>Subjects--Index Terms: </label>Applied physics Microlithography. Semiconductors --Etching Lasers --Industrial applications  
<br/><br/><label>LC Class. No.: </label> /  
<br/><br/><label>Dewey Class. No.: </label>621.381531  LIN