Ma, Xu, <br/><br/>
Computational lithography   

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 - New York  Wiley   c2010.  
 - xv, 226 p.:  ill;  25cm. 
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 - Wiley series in pure and applied optics. .
<br/><br/> Includes bibliographical references and index. 
<br/><br/><label>ISBN: </label>9780470596975 
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<br/><br/><label>Nat. Bib. No.: </label>  
<br/><br/><label>Nat. Bib. Agency Control No.: </label>  
<br/><br/><label>Subjects--Meeting Names: </label><br/>  
<br/><br/><label>Subjects--Index Terms: </label>Applied physics Microlithography -- Mathematics. Integrated circuits -- Design and construction -- Mathematics. Photolithography -- Mathematics. Semiconductors -- Etching -- Mathematics. Resolution (Optics) 
<br/><br/><label>LC Class. No.: </label> /  
<br/><br/><label>Dewey Class. No.: </label>621.381531  MAX