High-k gate dielectrics for CMOS technology

By:

Gang He

Contributor(s):

Sun, Zhaoqi [Co editor]

Material type:

TextPublication details: Wiley, 2024.ISBN:

9783527646371

Subject(s):

DDC classification:

621.38152 GAN

Online resources:

Click here to access e-book

Summary: State-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

List(s) this item appears in: IEEE-Wiley Semiconductor Ebooks

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Holdings
Item type	Current library	Call number	Materials specified	URL	Status
E- Books	IIT Gandhinagar	621.38152 GAN (Browse shelf(Opens below))	IEEE-Wiley Semiconductor Ebooks	Link to resource	Available

State-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological
viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these
materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.

Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections
with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

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