Glancing angle deposition of thin films: engineering the nanoscale

By:

Hawkeye, Matthew M

Contributor(s):

Material type:

TextPublication details: Wiley, 2024ISBN:

9781118847329

Subject(s):

DDC classification:

621.38152 HAW

Online resources:

Click here to access e-book

Summary: This book provides a highly practical treatment of Glancing Angle Deposition (GLAD), a thin film fabrication technology optimized to produce precise nanostructures from a wide range of materials. GLAD provides an elegant method for fabricating arrays of nanoscale helices, chevrons, columns, and other porous thin film architectures using physical vapour deposition processes such as sputtering or evaporation. The book gathers existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: Development and description of GLAD techniques for nanostructuring thin films Properties and characterization of nanohelices, nanoposts, and other porous films Design and engineering of optical GLAD films including fabrication and testing, and chiral films Post-deposition processing and integration to optimize film behaviour and structure Deposition systems and requirements for GLAD fabrication A patent survey, extensive relevant literature, and a survey of GLAD's wide range of material properties and diverse applications.

List(s) this item appears in: IEEE-Wiley Semiconductor Ebooks

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Item type	Current library	Call number	Materials specified	URL	Status
E- Books	IIT Gandhinagar	621.38152 HAW (Browse shelf(Opens below))	IEEE-Wiley Semiconductor Ebooks	Link to resource	Available

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Includes index

This book provides a highly practical treatment of Glancing Angle Deposition (GLAD), a thin film fabrication technology optimized to produce precise nanostructures from a wide range of materials. GLAD provides an elegant method for fabricating arrays of nanoscale helices, chevrons, columns, and other porous thin film architectures using physical vapour deposition processes such as sputtering or evaporation. The book gathers existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers:

Development and description of GLAD techniques for nanostructuring thin films
Properties and characterization of nanohelices, nanoposts, and other porous films
Design and engineering of optical GLAD films including fabrication and testing, and chiral films
Post-deposition processing and integration to optimize film behaviour and structure
Deposition systems and requirements for GLAD fabrication
A patent survey, extensive relevant literature, and a survey of GLAD's wide range of material properties and diverse applications.

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