Ferroelectric dielectrics integrated on silicon

Defay, Emmanuel (Ed.)

Ferroelectric dielectrics integrated on silicon - Wiley, 2024

Includes index

This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterization. An in-depth study of the influence of leakage currents is performed together with reliability discussion. Three applicative chapters cover integrated capacitors, variables capacitors and ferroelectric memories. The final chapter deals with a reasonably new research field, multiferroic thin films

9781118602768


Circuits
Devices
Engineered Materials
Dielectrics
Energy
IEEE-Wiley Semiconductor Ebooks

621.38152 DEF


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